In Situ Photocontrol of Block Copolymer Morphology During Dip-Coating of Thin Films-Reference-Cited by-同舟云学术

In Situ Photocontrol of Block Copolymer Morphology During Dip-Coating of Thin Films

Published:2015-09-28 Issue:10 Volume:4 Page:1158-1162
ISSN:2161-1653
Container-title:ACS Macro Letters
language:en
Short-container-title:ACS Macro Lett.

Author:

Vapaavuori Jaana¹,Grosrenaud Josué¹,Pellerin Christian¹,Bazuin C. Geraldine¹

Affiliation:

1. Département de chimie, Centre de recherche sur les matériaux auto−assemblés (CRMAA/CSACS), Université de Montréal, C.P. 6128 Succ. Centre−ville, Montréal, QC, Canada H3C 3J7

Funder

Natural Sciences and Engineering Research Council of Canada

Suomen Kulttuurirahasto

Emil Aaltosen Säätiö

Fonds de Recherche du Québec - Nature et Technologies

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acsmacrolett.5b00483

Reference33 articles.

1. Patternable Block Copolymers

2. Patterning and Templating for Nanoelectronics

3. Block Copolymers—Designer Soft Materials

4. Morphology, Thickness, and Composition Evolution in Supramolecular Block Copolymer Films over a Wide Range of Dip-Coating Rates

5. Preparation of Sol−Gel Films by Dip-Coating in Extreme Conditions

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