Thin Films of Homopolymers and Cylinder-Forming Diblock Copolymers under Shear
Author:
Affiliation:
1. Department of Chemical and Biological Engineering, Princeton University, Princeton, New Jersey 08544, United States
2. Center for Soft Matter Research and Department of Physics, New York University, New York, New York 10003, United States.
Funder
Division of Materials Research
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn502068e
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1. Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries
2. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly
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4. Unifying Weak- and Strong-Segregation Block Copolymer Theories
5. Aluminum nanowire polarizing grids: Fabrication and analysis
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