Toward the Design of a Sequential Two Photon Photoacid Generator for Double Exposure Photolithography-Reference-Cited by-同舟云学术

Toward the Design of a Sequential Two Photon Photoacid Generator for Double Exposure Photolithography

Published:2008-11-24 Issue:24 Volume:20 Page:7374-7376
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

O’Connor Naphtali A.¹,Berro Adam J.¹,Lancaster Jeffrey R.¹,Gu Xinyu¹,Jockusch Steffen¹,Nagai Tomoki¹,Ogata Toshiyuki¹,Lee Saul¹,Zimmerman Paul¹,Willson C. Grant¹,Turro Nicholas J.¹

Affiliation:

1. Department of Chemistry, Columbia University, New York, New York 10027, Department of Chemical Engineering, The University of Texas at Austin, Texas 78712, and Sematech, Austin, Texas 78741

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm802343u

Reference13 articles.

1. Double Exposure Materials: Simulation Study of Feasibility

2. Advanced materials for 193 nm immersion lithography

3. Extreme ultraviolet lithography: A review

4. Double patterning overlay budget for 45 nm technology node single and double mask approach

5. Multiphoton-absorbing organic materials for microfabrication, emerging optical applications and non-destructive three-dimensional imaging

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