Lithography with a Focused Soft X-ray Beam and a Monomolecular Resist-Reference-Cited by-同舟云学术

Lithography with a Focused Soft X-ray Beam and a Monomolecular Resist

Published:2004-02-10 Issue:6 Volume:20 Page:2050-2053
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Klauser Ruth¹,Huang Mao-Lin¹,Wang Shih-Chieh¹,Chen Chia-Hao¹,Chuang Tung Jung¹,Terfort Andreas¹,Zharnikov Michael¹

Affiliation:

1. National Synchrotron Radiation Research Center, 101 Hsin-Ann Road, Hsinchu 300, Taiwan, Center for Condensed Matter Sciences, National Taiwan University, Taipei 106, Taiwan, Anorganische und Angewandte Chemie, Universität Hamburg, 20146 Hamburg, Germany, and Angewandte Physikalische Chemie, Universität Heidelberg, 69120 Heidelberg, Germany

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la030398n

Reference22 articles.

1. Formation and Structure of Self-Assembled Monolayers

2. Nanoscale patterning of self-assembled monolayers with electrons

3. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

4. Nanometer-Scale Fabrication by Simultaneous Nanoshaving and Molecular Self-Assembly

5. Patterning Mesoscale Gradient Structures with Self-Assembled Monolayers and Scanning Tunneling Microscopy Based Replacement Lithography

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