Self-Assembled Monolayer-Assisted Negative Lithography-Reference-Cited by-同舟云学术

Self-Assembled Monolayer-Assisted Negative Lithography

Published:2015-02-27 Issue:9 Volume:31 Page:2922-2930
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Mu Xiaoyan¹,Gao Aiting¹,Wang Dehui¹,Yang Peng¹

Affiliation:

1. Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education, College of Chemistry and Chemical Engineering, Shaanxi Normal University, Xi’an 710062, China

Funder

State Administration of Foreign Experts Affairs

Ministry of Education of the People's Republic of China

National Natural Science Foundation of China

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la504516e

Reference56 articles.

1. Self-Assembled Monolayers of Thiolates on Metals as a Form of Nanotechnology

2. Controlling local disorder in self-assembled monolayers by patterning the topography of their metallic supports

3. Patterning Disorder in Monolayer Resists for the Fabrication of Sub-100-nm Structures in Silver, Gold, Silicon, and Aluminum

4. Using Two-Stage Chemical Amplification To Determine the Density of Defects in Self-Assembled Monolayers of Alkanethiolates on Gold

5. A Selective Etching Solution for Use with Patterned Self-Assembled Monolayers of Alkanethiolates on Gold

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