Chemical Interaction of H2, Br2, and HBr with α-Boron Surfaces
Author:
Affiliation:
1. Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, Box 538, S-751 21 Uppsala, Sweden
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp0113432
Reference21 articles.
1. Deposition rate and rate-limiting steps in the chemical vapour deposition of boron in a closed system
2. Kinetics of boron deposition from BBR3 + H2
3. BHCl2 Formation during Chemical Vapor Deposition of Boron in a Dual-Impinging Jet Reactor
4. Adsorption of monatomic hydrogen in icosahedral borides
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