Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy-Reference-Cited by-同舟云学术

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Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy

Published:2013-03-05 Issue:4 Volume:13 Page:1485-1490
ISSN:1528-7483
Container-title:Crystal Growth & Design
language:en
Short-container-title:Crystal Growth & Design

Author:

Nepal Neeraj¹,Mahadik Nadeemullah A.¹,Nyakiti Luke O.¹,Qadri Syed B.²,Mehl Michael J.²,Hite Jennifer K.¹,Eddy Charles R¹

Affiliation:

1. Electronics Science & Technology Division, U.S. Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, D.C. 20375, United States

2. Material Sciences and Technology Division, U.S. Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, D.C. 20375, United States

Publisher

American Chemical Society (ACS)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cg3016172

Reference28 articles.

1. Indium nitride (InN): A review on growth, characterization, and properties

2. Growth of cubic InN on InAs(001) by plasma-assisted molecular beam epitaxy

3. Band gap and band parameters of InN and GaN from quasiparticle energy calculations based on exact-exchange density-functional theory

4. Elastic, structural, bonding, and defect properties of zinc-blende BN, AlN, GaN, InN and their alloys

5. RF-Molecular Beam Epitaxy Growth and Properties of InN and Related Alloys

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1. Study of Mid-Pressure Ar Radiofrequency Plasma Used in Plasma-Enhanced Atomic Layer Deposition of α-Al2O3;Processes;2024-03-20

2. Coherent X-ray Spectroscopy Elucidates Nanoscale Dynamics of Plasma-Enhanced Thin-Film Growth;ACS Nano;2024-01-09

3. Atomic Layer Deposition as the Enabler for the Metastable Semiconductor InN and Its Alloys;Crystal Growth & Design;2023-09-19

4. Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces;Journal of Vacuum Science & Technology A;2023-08-31

5. On the limitations of thermal atomic layer deposition of InN using ammonia;Journal of Vacuum Science & Technology A;2023-02-21

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