Anisotropic Wet Etched Silicon Substrates for Reoriented and Selective Growth of ZnO Nanowires and Enhanced Hydrophobicity
Author:
Affiliation:
1. Ecole Normale Supérieure, CNRS-ENS-UPMC 8640, 24 rue Lhomond, 75005 Paris, France
2. Institute for Integrated Cell-Material Sciences, Kyoto University, 606-8507 Kyoto, Japan
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/la201157m
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