Characterization of GeO2 Sub-monolayers on SiO2 Prepared by Chemical Vapor Deposition of Ge(OMe)4 by EXAFS, FT-IR, and XRD-Reference-Cited by-同舟云学术

Characterization of GeO2 Sub-monolayers on SiO2 Prepared by Chemical Vapor Deposition of Ge(OMe)4 by EXAFS, FT-IR, and XRD

Published:1998-05-30 Issue:13 Volume:14 Page:3607-3613
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Okumura K.¹,Asakura K.¹,Iwasawa Y.¹

Affiliation:

1. Department of Chemistry, Graduate School of Science and Research Center for Spectrochemistry, Faculty of Science, The University of Tokyo, Hongo, Bunkyo-ku, Tokyo 113, Japan

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la970262n

Reference27 articles.

1. Selective isopentane formation from CH3OH on a new one-atomic layer ZrO2/ZSM-5 hybrid catalyst

2. THE SURFACE STRUCTURE AND CATALYTIC PROPERTIES OF ONE-ATOMIC LAYER AMORPHOUS NIOBIUM-OXIDE ATTACHED ON SiO2

3. Monolayer structures of niobic acids supported on silica and their catalytic activities for esterification of acetic acid with ethanol

4. New Reversible Enhancement/Depression Phenomenon on Catalysis of Platinum Supported on One-Atomic Layer Niobium Oxide for Ethene Hydrogenation

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