Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O2 Plasma
Author:
Affiliation:
1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, Eindhoven 5600 MB, The Netherlands
2. TNO-Holst Centre, High Tech Campus 21, Eindhoven 5656 AE, The Netherlands
Funder
TNO-Holst Centre, High Tech Campus Eindhoven
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
http://pubs.acs.org/doi/pdf/10.1021/acsami.8b12767
Reference51 articles.
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3. Atomic Layer Etching of Al2O3 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and Hydrogen Fluoride
4. Damage-Free Smooth-Sidewall InGaAs Nanopillar Array by Metal-Assisted Chemical Etching
5. Pan, D. Z.; Liebmann, L.; Yu, B.; Xu, X.; Lin, Y. Pushing Multiple Patterning in Sub-10 nm. Proceedings of the 52nd Annual Design Automation Conference on—DAC ’15 2015, pp 1–6.
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