Ultralarge Area Sub-10 nm Plasmonic Nanogap Array by Block Copolymer Self-Assembly for Reliable High-Sensitivity SERS-Reference-Cited by-同舟云学术

Ultralarge Area Sub-10 nm Plasmonic Nanogap Array by Block Copolymer Self-Assembly for Reliable High-Sensitivity SERS

Published:2018-11-27 Issue:51 Volume:10 Page:44660-44667
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Jin Hyeong Min^ORCID,Kim Ju Young¹,Heo Minsung,Jeong Seong-Jun²³,Kim Bong Hoon,Cha Seung Keun,Han Kyu Hyo,Kim Jang Hwan,Yang Geon Gug,Shin Jonghwa^ORCID,Kim Sang Ouk^ORCID

Affiliation:

1. Multidisciplinary Sensor Research Group, Electronics and Telecommunications Research Institute (ETRI), Daejeon 34129, Republic of Korea

2. Department of Organic Materials and Fiber Engineering, Soongsil University, 369 Sangdo-ro, Dongjak-gu, Seoul 06978, Republic of Korea

3. Department of Information Communication, Materials, and Chemistry Convergence Technology, Soongsil University, 369 Sangdo-ro, Dongjak-gu, Seoul 06978, Republic of Korea

Funder

National Research Foundation of Korea

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.8b17325

Reference48 articles.

1. SERS: Materials, applications, and the future

2. Surface raman spectroelectrochemistry

3. Anomalously intense Raman spectra of pyridine at a silver electrode