Evaluation of Thermal and Radiation Induced Chemistries of Metal Oxo–Hydroxo Clusters for Next-Generation Nanoscale Inorganic Resists-Reference-Cited by-同舟云学术

Evaluation of Thermal and Radiation Induced Chemistries of Metal Oxo–Hydroxo Clusters for Next-Generation Nanoscale Inorganic Resists

Published:2018-08-20 Issue:9 Volume:1 Page:4548-4556
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Oleksak Richard P.^ORCID,Ruther Rose E.,Luo Feixiang¹,Amador Jennie M.,Decker Shawn R.,Jackson Milton N.²,Motley Joshua R.,Stowers Jason K.,Johnson Darren W.²^ORCID,Garfunkel Eric L.¹,Keszler Douglas A.^ORCID,Herman Gregory S.^ORCID

Affiliation:

1. Department of Chemistry and Chemical Biology, Rutgers University, Piscataway, New Jersey 08854, United States

2. Department of Chemistry and Biochemistry & Materials Science Institute, University of Oregon, Eugene, Oregon 97403-1253, United States

Funder

Division of Chemistry

Semiconductor Research Corporation

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.8b00865

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