Particle Deposition Kinetics of Colloidal Suspensions in Microchannels at High Ionic Strength-Reference-Cited by-同舟云学术

Particle Deposition Kinetics of Colloidal Suspensions in Microchannels at High Ionic Strength

Published:2017-06-21 Issue:26 Volume:33 Page:6471-6480
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Cejas Cesare M.¹^ORCID,Monti Fabrice¹,Truchet Marine¹,Burnouf Jean-Pierre²,Tabeling Patrick¹

Affiliation:

1. Microfluidics, MEMS, Nanostructures Laboratory, CNRS Gulliver UMR7083, Institut Pierre Gilles de Gennes (IPGG), ESPCI Paris, PSL Research University, 6 rue Jean Calvin, Paris 75005, France

2. PDP-Predevelopment Sciences-Early Development, Sanofi Recherche, 13 quai Jules Guesde, BP 14 Vitry-sur-Seine 94403, France

Funder

IPGG

Sanofi Recherche

ESPCI Paris

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.7b01394

Reference44 articles.

1. Effects of shear and walls on the diffusion of colloids in microchannels

2. Suspension flow in microfluidic devices — A review of experimental techniques focussing on concentration and velocity gradients

3. Motion of a particle between two parallel plane walls in low-Reynolds-number Poiseuille flow

4. The resistance to a particle of arbitrary shape in translational motion at small Reynolds numbers

5. The slow motion of a sphere through a viscous fluid towards a plane surface

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