Universal Nanopatterning Technique Combining Secondary Sputtering with Nanoscale Electroplating for Fabricating Size-Controllable Ultrahigh-Resolution Nanostructures-Reference-Cited by-同舟云学术

Universal Nanopatterning Technique Combining Secondary Sputtering with Nanoscale Electroplating for Fabricating Size-Controllable Ultrahigh-Resolution Nanostructures

Published:2017-08-08 Issue:33 Volume:33 Page:8260-8266
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Song Tae-Eun¹²,Ahn Chi Won¹,Jeon Hwan-Jin³⁴^ORCID

Affiliation:

1. Department of Nano-Structured Materials Research, National NanoFab Center (NNFC), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea

2. Institute für Materialphysik, Wilhelm-Klemm-Straße 10, D-48149 Münster, Germany

3. Department of Chemical Engineering and Biotechnology, Korea Polytechnic University, 237 Sangidaehak-ro, Siheung-si, Gyeonggi-do 15073, Republic of Korea

4. Department of Information Device and Fusion Materials Engineering, Korea Polytechnic University, 237 Sangidaehak-ro, Siheung-si, Gyeonggi-do 15073, Republic of Korea

Funder

National Research Foundation of Korea

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.7b00950

Reference37 articles.

1. Nanophase Materials Assembled from Atomic Clusters

2. Microemulsion-Mediated Synthesis of Nanosize Molybdenum Sulfide Particles

3. Optical transient bleaching of quantum‐confined CdS clusters: The effects of surface‐trapped electron–hole pairs

4. Micro- and Nanopatterning Techniques for Organic Electronic and Optoelectronic Systems

5. Mogul-Patterned Elastomeric Substrate for Stretchable Electronics

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