Patterning of Metal Films on Arbitrary Substrates by Using Polydopamine as a UV-Sensitive Catalytic Layer for Electroless Deposition-Reference-Cited by-同舟云学术

Patterning of Metal Films on Arbitrary Substrates by Using Polydopamine as a UV-Sensitive Catalytic Layer for Electroless Deposition

Published:2016-05-20 Issue:21 Volume:32 Page:5285-5290
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Zhao Lei¹,Chen Daqun¹,Hu Weihua¹

Affiliation:

1. Institute for Clean Energy & Advanced Materials, Faculty of Materials and Energy, Chongqing Key Laboratory for Advanced Materials and Technologies of Clean Energies, Southwest University, Chongqing 400715, China

Funder

Ministry of Education of the People's Republic of China

National Natural Science Foundation of China

Chongqing Key Laboratory for Advanced Materials and Technologies of Clean Energies

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.6b01118

Reference37 articles.

1. Direct, Rapid, Facile Photochemical Method for Preparing Copper Nanoparticles and Copper Patterns

2. Liquid-Phase Deposition of Freestanding Copper Foils and Supported Copper Thin Films and Their Structuring into Conducting Line Patterns

3. Polymer-Assisted Metal Deposition (PAMD): A Full-Solution Strategy for Flexible, Stretchable, Compressible, and Wearable Metal Conductors

4. Individually Position-Addressable Metal-Nanofiber Electrodes for Large-Area Electronics

5. Preparation of Metallic Films on Elastomeric Stamps and Their Application for Contact Processing and Contact Printing

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