Nanometer-Thick Gold on Silicon as a Proxy for Single-Crystal Gold for the Electrodeposition of Epitaxial Cuprous Oxide Thin Films-Reference-Cited by-同舟云学术

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Nanometer-Thick Gold on Silicon as a Proxy for Single-Crystal Gold for the Electrodeposition of Epitaxial Cuprous Oxide Thin Films

Published:2016-06-07 Issue:24 Volume:8 Page:15828-15837
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Switzer Jay A.¹,Hill James C.¹,Mahenderkar Naveen K.²,Liu Ying-Chau¹

Affiliation:

1. Department of Chemistry and Graduate Center for Materials Research, Missouri University of Science and Technology, Rolla, Missouri 65409-1170, United States, and

2. Department of Materials Science and Engineering and Graduate Center for Materials Research, Missouri University of Science and Technology, Rolla, Missouri 65409-1170, United States

Funder

Basic Energy Sciences

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.6b04552

Reference47 articles.

1. Underpotential deposition of metals and work function differences

2. Underpotential Deposition at Single Crystal Surfaces of Au, Pt, Ag and Other Materials

3. Metal monolayer deposition by replacement of metal adlayers on electrode surfaces

4. Electrochemical Atomic Layer Epitaxy

5. Electrochemical atomic layer epitaxy (ECALE)

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