Etching and Chemical Control of the Silicon Nitride Surface-Reference-Cited by-同舟云学术

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Etching and Chemical Control of the Silicon Nitride Surface

Published:2017-01-11 Issue:3 Volume:9 Page:3075-3084
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Brunet Marine¹²,Aureau Damien³,Chantraine Paul¹,Guillemot François²,Etcheberry Arnaud³,Gouget-Laemmel Anne Chantal¹^ORCID,Ozanam François¹

Affiliation:

1. Laboratoire de Physique de la Matière Condensée, Ecole Polytechnique, CNRS, Université Paris-Saclay, 91128 Palaiseau, France

2. Saint-Gobain Recherche, 39 quai Lucien Lefranc, 93303 Aubervilliers, France

3. Institut Lavoisier, UVSQ-CNRS UMR 8180, 78035 Versailles, France

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.6b12880

Reference57 articles.

1. Chemical vapour-deposited silicon nitride

2. Vapor Deposition of Silicon Nitride Film on Silicon and Properties of MNS Diodes

3. Passivation of GaAs Power Field-Effect Transistor Using Electron Cyclotron Resonance Chemical Vapor Deposition Silicon Nitride Technique

4. The preparation, characterization and applications of silicon nitride thin films

5. Structure and Sodium Migration in Silicon Nitride Films

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