Investigation of silicon nitride for spacer via plasma-enhanced atomic layer deposition using a (tert-butylamino)dimethylsilane precursor
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Published:2024-10
Issue:
Volume:670
Page:160715
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ISSN:0169-4332
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Container-title:Applied Surface Science
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language:en
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Short-container-title:Applied Surface Science
Author:
Park Chae-Yeon,
Lin Yang Hae,
Kim Hye-Mi,
Kim DaejungORCID,
Park Yongjoo,
Park Jongruyl,
Shin SeokheeORCID,
Park Jin-SeongORCID
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