Exclusively Gas-Phase Passivation of Native Oxide-Free Silicon(100) and Silicon(111) Surfaces-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Exclusively Gas-Phase Passivation of Native Oxide-Free Silicon(100) and Silicon(111) Surfaces

Published:2016-05-13 Issue:20 Volume:8 Page:13157-13165
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Tao Ye¹²,Hauert Roland³,Degen Christian L.¹

Affiliation:

1. Department of Physics, ETH Zürich, 8093 Zürich, Switzerland

2. Department of Chemistry, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States

3. Empa, Swiss Federal Laboratories of Materials Science and Technology, 8600 Dübendorf, Switzerland

Funder

European Research Council

Swiss National Science Foundation

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.6b03326

Reference74 articles.

1. Highly Stable Organic Monolayers for Reacting Silicon with Further Functionalities: The Effect of the C−C Bond nearest the Silicon Surface

2. Highly Stable Organic Modification of Si(111) Surfaces: Towards Reacting Si with Further Functionalities while Preserving the Desirable Chemical Properties of Full Si−C Atop Site Terminations

3. Alkyl monolayers covalently bonded to silicon surfaces

4. Alkyl Monolayers on Silicon Prepared from 1-Alkenes and Hydrogen-Terminated Silicon

5. Electrochemical Formation of Close-Packed Phenyl Layers on Si(111)

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomistic insights into resistance to oxidation of Si (111) grafted different organic chains;Computational Materials Science;2021-04

2. Atomistic Insights into Oxidation of Chemical Passivated Silicon (100) Surface: Reactive Molecular Dynamic Simulations;Chinese Journal of Chemistry;2021-03-29

3. Reactive molecular dynamics on the oxidation of passivated H-terminated Si (111) surface: 1-Alkynes vs 1-Alkenes;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2020-12

4. Vapor-Phase Passivation of Chlorine-Terminated Ge(100) Using Self-Assembled Monolayers of Hexanethiol;ACS Applied Materials & Interfaces;2020-06-19

5. Low-temperature laser generated ultrathin aluminum oxide layers for effective c-Si surface passivation;Applied Surface Science;2019-06

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3