Facile Synthesis of Photosensitive Poly(semi-alicyclic benzoxazole) and Subsequent Low-Temperature Cyclization of Poly(o-hydroxy amide)
Author:
Affiliation:
1. Department of Organic & Polymeric Materials, Graduate School of Science & Engineering, Tokyo Institute of Technology, 2-12-1-H120, O-okayama, Meguro-ku, Tokyo, Japan 152-8552
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma0513665
Reference24 articles.
1. New high temperature stable positive photoresists based on hydroxy polyimides and polyamides containing the hexafluoroisopropylidene (6-f) linking group
2. Photosensitive poly(benzoxazole) based on precursor from diphenyl isophthalate and bis(o-aminophenol)
3. New synthetic route for photosensitive poly(benzoxazole)
4. Synthesis of a highly transparent poly(o-hydroxyamide) in the i-line region and its application to photosensitive polymers
5. Application for WLP at positive working photosensitive polybenzoxazole.
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