A Review and Unifying Analysis of Defect Decoration and Surface Polishing by Chemical Etching in Silicon Processing
Author:
Affiliation:
1. MEMC Electronic Materials, 501 Pearl Drive, MZ 80, Saint Peters, Missouri 63376-0008
Publisher
American Chemical Society (ACS)
Subject
Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ie020716y
Reference53 articles.
1. Shimura, F.Semiconductor Silicon Crystal Technology; Academic Press: San Diego, 1989; pp 184−186.
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3. New trends in atomic scale simulation of wet chemical etching of silicon with koh
4. The Etching Mechanisms of SiO2 in Hydrofluoric Acid
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