Role of the Background Gas in the Morphology and Optical Properties of Laser-Microstructured Silicon-Reference-Cited by-同舟云学术

Role of the Background Gas in the Morphology and Optical Properties of Laser-Microstructured Silicon

Published:2005-06-09 Issue:14 Volume:17 Page:3582-3586
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Sheehy Michael A.¹,Winston Luke¹,Carey James E.¹,Friend Cynthia M.¹,Mazur Eric¹

Affiliation:

1. Department of Chemistry, Harvard University, 12 Oxford Street, Cambridge, Massachusetts 02138, and Division of Engineering and Applied Science, Harvard University, 9 Oxford Street, Cambridge, Massachusetts 02138

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm049029i

Reference17 articles.

1. The effect of dopant diffusion vapor pressure on the properties of sulfur and selenium doped silicon infrared detectors

2. Optical activation of inefficient sulfur dopants in hydrogenated amorphous silicon: A new metastable effect

3. Microstructuring of silicon with femtosecond laser pulses

4. Multiple photon excited SF6 interaction with silicon surfaces

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