Highly Condensed Epoxy−Oligosiloxane-Based Hybrid Material for Transparent Low-k Dielectric Coatings
Author:
Affiliation:
1. Laboratory of Optical Materials and Coating, Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701, Republic of Korea
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/am900252v
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4. Characterization of low permittivity (low-k) polymeric dielectric films for low temperature device integration
5. Improvement of Hydrogenated Amorphous-Silicon TFT Performances With Low-$k$Siloxane-Based Hydrogen Silsesquioxane (HSQ) Passivation Layer
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