Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays
Author:
Affiliation:
1. Department of Materials Science and Engineering and ‡Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn203767s
Reference33 articles.
1. Theory of Microphase Separation in Block Copolymers
2. Block Copolymer Thermodynamics: Theory and Experiment
3. Block Copolymers as a Tool for Nanomaterial Fabrication
4. Graphoepitaxy of Spherical Domain Block Copolymer Films
5. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter
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