Annealing Process Dependence of the Self-Assembly of Rod–Coil Block Copolymer Thin Films-Reference-Cited by-同舟云学术

Annealing Process Dependence of the Self-Assembly of Rod–Coil Block Copolymer Thin Films

Published:2021-02-08 Issue:4 Volume:54 Page:1657-1664
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Shi Ling-Ying¹²^ORCID,Yin Chengxiao¹,Zhou Bo¹,Xia Wei¹,Weng Lin¹,Ross Caroline A.²^ORCID

Affiliation:

1. College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China

2. Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States

Funder

National Natural Science Foundation of China

Division of Materials Research

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.0c02712

Reference54 articles.

1. Block Copolymers—Designer Soft Materials

2. High χ–Low N Block Polymers: How Far Can We Go?

3. Macroscopic 10-Terabit–per–Square-Inch Arrays from Block Copolymers with Lateral Order

4. Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays

5. 50th Anniversary Perspective: Block Polymers—Pure Potential

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