Titanium cluster polymers as reactive ion etch barriers-Reference-Cited by-同舟云学术

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Titanium cluster polymers as reactive ion etch barriers

Published:1995-08-01 Issue:8 Volume:7 Page:1534-1538
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Katz H. E.,Schilling M. L.,Stein S. M.,Houlihan F. M.,Hutton R. S.,Taylor G. N.

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm00056a020

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electrodeposition of nickel, cobalt, and iron on polypyrrole films;Thin Solid Films;2013-12

2. Selective Electroless Metallization of Patterned Polymeric Films for Lithography Applications;ACS Applied Materials & Interfaces;2009-01-12

3. Titanium-Oxo Clusters, Versatile Nanobuilding Blocks for the Design of Advanced Hybrid Materials;Monatshefte für Chemie - Chemical Monthly;2006-05

4. Structure and surface reactivity of transition-metal–oxo–organo clusters: contribution of liquid- and solid-state NMR to the characterization of the cluster Ti16O16(OEt)32;Comptes Rendus Chimie;2004-03

5. Application of Electroless Nickel−Boron Films for High-Selectivity Pattern Transfer Processes;Chemistry of Materials;2002-10-15

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