Novel Nickel Precursors for Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Novel Nickel Precursors for Chemical Vapor Deposition

Published:2003-09-11 Issue:20 Volume:15 Page:3735-3738
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Choi Hyungsoo¹,Park Sungho¹,Kim Tae Hyung¹

Affiliation:

1. Micro and Nanotechnology Laboratory and Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm034210x

Reference18 articles.

1. Iron and nickel thin film deposition via metallocene decomposition

2. Controlled Growth of Ni Particles on Si(100)1a

3. Preliminary studies of Ni(dmen)2(CF3CO2)2, Ni(deen)2(CF3CO2)2 and Ni(en)(CF3C(O)CHC(O)CF3)2 as precursors for metalorganic chemical vapour deposition: structures, thermal behaviours and vapour pressures

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