Thermoelectric Efficiency of Epitaxial GeSn Alloys for Integrated Si-Based Applications: Assessing the Lattice Thermal Conductivity by Raman Thermometry

Author:

Spirito Davide1ORCID,von den Driesch Nils2ORCID,Manganelli Costanza Lucia1,Zoellner Marvin Hartwig1ORCID,Corley-Wiciak Agnieszka Anna1,Ikonic Zoran3,Stoica Toma4ORCID,Grützmacher Detlev2,Buca Dan2,Capellini Giovanni15ORCID

Affiliation:

1. IHP—Leibniz-Institut für innovative Mikroelektronik, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany

2. Peter Grünberg Institute 9 (PGI-9) and JARA-Fundamentals of Future Information Technologies (JARA-FIT), Forschungszentrum Jülich, 52425 Jülich, Germany

3. Pollard Institute, School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, U.K.

4. National Institute of Materials Physics, 405A Atomistilor Street, 077125 Magurele, Romania

5. Dipartimento di Scienze, Università Roma Tre, Viale G. Marconi 446, 00146 Roma, Italy

Funder

Bundesministerium f??r Bildung und Forschung

Publisher

American Chemical Society (ACS)

Subject

Electrical and Electronic Engineering,Materials Chemistry,Electrochemistry,Energy Engineering and Power Technology,Chemical Engineering (miscellaneous)

Reference39 articles.

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