Surface Reactivity and Energetics of CH Radicals during Plasma Deposition of Hydrogenated Diamondlike Carbon Films
Author:
Affiliation:
1. Department of Chemistry, Colorado State University, Fort Collins, Colorado 80523-1872
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp064125n
Reference49 articles.
1. Plasma plume characteristics and properties of pulsed laser deposited diamond-like carbon films
2. Characterization of diamond-like carbon thin films prepared by a microwave plasma enhanced chemical vapor deposition method
3. Effects of sp2/sp3 bonding ratios on field emission properties of diamond-like carbon films grown by microwave plasma chemical vapor deposition
4. Growth characterization and properties of diamond-like carbon films by electron cyclotron resonance chemical vapor deposition
5. Diamond-like carbon coatings on microdrill using an ECR-CVD system
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