Wetting Behavior of Block Copolymers on Self-Assembled Films of Alkylchlorosiloxanes: Effect of Grafting Density-Reference-Cited by-同舟云学术

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Wetting Behavior of Block Copolymers on Self-Assembled Films of Alkylchlorosiloxanes: Effect of Grafting Density

Published:2000-10-21 Issue:24 Volume:16 Page:9620-9626
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Peters Richard D.¹,Yang Xiao M.¹,Kim Tae K.¹,Nealey Paul F.¹

Affiliation:

1. Department of Chemical Engineering and Center for Nanotechnology, University of Wisconsin, Madison, WI 53706

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la000822%2B

Reference44 articles.

1. Characteristics of the surface-induced orientation for symmetric diblock PS/PMMA copolymers

2. Surface-induced orientation of symmetric, diblock copolymers: a secondary ion mass-spectrometry study

3. Ordered Diblock Copolymer Films on Random Copolymer Brushes

4. Using Self-Assembled Monolayers Exposed to X-rays To Control the Wetting Behavior of Thin Films of Diblock Copolymers

5. Chemical Modification of Self-Assembled Monolayers by Exposure to Soft X-rays in Air

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