Thermal Decomposition Mechanism of Disilane-Reference-Cited by-同舟云学术

Thermal Decomposition Mechanism of Disilane

Published:2006-03-18 Issue:14 Volume:110 Page:4726-4731
ISSN:1089-5639
Container-title:The Journal of Physical Chemistry A
language:en
Short-container-title:J. Phys. Chem. A

Author:

Yoshida Kazumasa¹,Matsumoto Keiji¹,Oguchi Tatsuo¹,Tonokura Kenichi¹,Koshi Mitsuo¹

Affiliation:

1. Department of Chemical System Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan, and Department of Ecological Engineering, Toyohashi University of Technology, Toyohashi 441-8580, Japan

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp055280p

Reference35 articles.

1. Ab initio MO study of the thermal decomposition of fluorinated disilanes, Si2H6-nFn (n = 0, 1, 2)

2. Ab initio study of silylene and dimethylsilylene insertion mechanisms into the silicon-hydrogen bonds of silane and methylsilane

3. Prototype Si—H insertion reaction of silylene with silane. Absolute rate constants, temperature dependence, RRKM modelling and the potential-energy surface

4. Thermochemistry and Thermal Decomposition of the Chlorinated Disilanes (Si2HnCl6-n, n = 0−6) Studied by ab Initio Molecular Orbital Methods

5. Formation Mechanism of Hydrogenated Silicon Clusters during Thermal Decomposition of Disilane

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