Conversion of Bilayers of PS-b-PDMS Block Copolymer into Closely Packed, Aligned Silica Nanopatterns-Reference-Cited by-同舟云学术

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Conversion of Bilayers of PS-b-PDMS Block Copolymer into Closely Packed, Aligned Silica Nanopatterns

Published:2013-05-15 Issue:6 Volume:7 Page:5595-5606
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Wu Nathanael L. Y.¹²,Harris Kenneth D.¹,Buriak Jillian M.¹³

Affiliation:

1. National Institute for Nanotechnology (NINT), National Research Council, 11421 Saskatchewan Drive, Edmonton, Alberta T6G 2M9, Canada

2. Department of Electrical and Computer Engineering, University of Alberta, Edmonton, Alberta T6G 2G8, Canada

3. Department of Chemistry, University of Alberta, Edmonton, Alberta T6G 2G2, Canada

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/nn401968t

Reference60 articles.

1. Directing the self-assembly of block copolymers

2. Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

3. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics

4. Functional Block Copolymers: Nanostructured Materials with Emerging Applications

5. Gradient Solvent Vapor Annealing of Block Copolymer Thin Films Using a Microfluidic Mixing Device

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1. Direct Printing of Ultrathin Block Copolymer Film with Nano‐in‐Micro Pattern Structures;Advanced Science;2023-08-21

2. Selective solvent vapor induced self-assembly of silicon-containing bottlebrush block copolymer thin films to generate mesoporous silicon oxide patterns;Polymer;2023-06

3. Trilayered Block Copolymer Nanostructures Formed by an Iterative Layering Strategy;Advanced Materials Interfaces;2023-03-28

4. Plasmonic nanocavities fabricated by directed self-assembly lithography and nanotransfer printing and used as surface-enhanced Raman scattering substrates;Microelectronic Engineering;2020-04

5. Strain-Dependent Nanowrinkle Confinement of Block Copolymers;Nano Letters;2020-01-13

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