Toward the In Situ Remediation of Carbon Deposition on Ru-Capped Multilayer Mirrors Intended for EUV Lithography: Exploiting the Electron-Induced Chemistry-Reference-Cited by-同舟云学术

Toward the In Situ Remediation of Carbon Deposition on Ru-Capped Multilayer Mirrors Intended for EUV Lithography: Exploiting the Electron-Induced Chemistry

Published:2007-07-31 Issue:33 Volume:111 Page:12165-12168
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Davis David J.¹,Kyriakou Georgios¹,Grant Robert B.¹,Tikhov Mintcho S.¹,Lambert Richard M.¹

Affiliation:

1. Chemistry Department, Cambridge University, Cambridge CB2 1EW, U.K., and Lithography Subsystems, BOC Edwards, Manor Royal, Crawley, West Sussex, U.K.

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp074766y

Reference14 articles.

1. Electron Impact-Assisted Carbon Film Growth on Ru(0001): Implications for Next-Generation EUV Lithography

2. Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

3. Radiation-induced protective carbon coating for extreme ultraviolet optics

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