Conduction Mechanism in Acceptor- or Donor-Doped ZrO<sub>2</sub> Bulk and Thin Films-Reference-Cited by-同舟云学术

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Conduction Mechanism in Acceptor- or Donor-Doped ZrO₂ Bulk and Thin Films

Published:2023-06-22 Issue:26 Volume:15 Page:31627-31634
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Kim Minseok¹,Oh Seyoung¹,Cho Byungjin¹²,Joo Jong Hoon³^ORCID

Affiliation:

1. Department of Urban, Energy, and Environmental Engineering, Chungbuk National University, 1 Chungdaero, Seowon-gu, Cheongju, Chungbuk 28644, Republic of Korea

2. Department of Advanced Material Engineering, Chungbuk National University, 1 Chungdaero, Seowon-gu, Cheongju, Chungbuk 28644, Republic of Korea

3. School of Earth Sciences and Environmental Engineering, Gwangju Institute of Science and Technology, 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, Republic of Korea

Funder

Samsung

National Research Foundation of Korea

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.3c04758

Reference52 articles.

1. Pushing the Limits

2. Novel high-κ dielectrics for next-generation electronic devices screened by automated ab initio calculations

3. Interband Transitions in Sol−Gel-Derived ZrO2 Films under Different Calcination Conditions

4. Ge-stabilized tetragonal ZrO2 as gate dielectric for Ge metal-oxide-semiconductor capacitors fabricated on Si substrate

5. Structural disorder and phase transitions in ZrO2-Y2O3 system

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1. Conduction mechanisms analysis of ZrO2-based electrochemical metallization RRAM in different RESET modes;Chinese Journal of Physics;2024-10

2. Electrical Conduction Mechanism of Mg-Doped ZrO2 Thin Films;Materials;2024-07-24

3. P‐1.4: Synergistic Enhancement of Stability and Mobility in ZrO₂‐Doped ITZO TFTs with MLO Passivation;SID Symposium Digest of Technical Papers;2024-04

4. Charge Transport in the A₆B₂O₁₇ (A = Zr, Hf; B = Nb, Ta) Superstructure Series;Journal of The Electrochemical Society;2024-03-07

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