Selective Removal of Gold: N-Heterocyclic Carbenes as Positive Etch Resists on Planar Gold Surfaces-Reference-Cited by-同舟云学术

Selective Removal of Gold: N-Heterocyclic Carbenes as Positive Etch Resists on Planar Gold Surfaces

Published:2023-07-21 Issue:30 Volume:15 Page:36831-36838
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Bosse Florian¹,Gutheil Christian¹,Nguyen D. Thao¹,Freitag Matthias¹,Das Mowpriya¹^ORCID,Tyler Bonnie J.²^ORCID,Adolphs Thorsten²,Schäfer Andreas H.³,Arlinghaus Heinrich F.²,Glorius Frank¹^ORCID,Ravoo Bart Jan¹^ORCID

Affiliation:

1. Organisch-Chemisches Institut and Center for Soft Nanoscience Westfälische Wilhelms-Universität Münster Corrensstraße 36, 48149 Münster, Germany

2. Physikalisches Institut and Center for Soft Nanoscience Westfälische Wilhelms-Universität Münster Wilhelm-Klemm-Straße 10, 48149 Münster, Germany

3. nanoAnalytics GmbH Heisenbergstraße 11, 48149 Münster, Germany

Funder

Deutsche Forschungsgemeinschaft

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.3c01046

Reference60 articles.

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2. Carbene Ligands in Surface Chemistry: From Stabilization of Discrete Elemental Allotropes to Modification of Nanoscale and Bulk Substrates

3. An Electron‐Rich Cyclic (Alkyl)(Amino)Carbene on Au(111), Ag(111), and Cu(111) Surfaces

4. A Unidirectional Surface-Anchored N-Heterocyclic Carbene Rotor

5. Controlled growth of ordered monolayers of N-heterocyclic carbenes on silicon

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