Stability of N-Heterocyclic Carbene Monolayers under Continuous Voltammetric Interrogation-Reference-Cited by-同舟云学术

Stability of N-Heterocyclic Carbene Monolayers under Continuous Voltammetric Interrogation

Published:2023-07-14 Issue:29 Volume:15 Page:35701-35709
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Pellitero Miguel Aller¹^ORCID,Jensen Isabel M.²,Dominique Nathaniel L.³^ORCID,Ekowo Lilian Chinenye³^ORCID,Camden Jon P.³^ORCID,Jenkins David M.²^ORCID,Arroyo-Currás Netzahualcóyotl¹^ORCID

Affiliation:

1. Department of Pharmacology and Molecular Sciences, Johns Hopkins University School of Medicine, Baltimore, Maryland 21205, United States

2. Department of Chemistry, University of Tennessee, Knoxville, Tennessee 37996, United States

3. Department of Chemistry and Biochemistry, University of Notre Dame, Notre Dame, Indiana 46556, United States

Funder

Division of Chemistry

University of Notre Dame

National Institute of General Medical Sciences

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.3c06148

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5. DNA-Modified Electrodes Fabricated Using Copper-Free Click Chemistry for Enhanced Protein Detection

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