UV-Induced Synthesis of Hybrid HMDSO/SiO<sub>2</sub> Thin Films with Compositional Gradients for High-Performance Atomic Oxygen Resistance-Reference-Cited by-同舟云学术

UV-Induced Synthesis of Hybrid HMDSO/SiO₂ Thin Films with Compositional Gradients for High-Performance Atomic Oxygen Resistance

Published:2023-10-06 Issue:41 Volume:15 Page:48810-48817
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Li Yi¹^ORCID,Li Zhonghua¹,He Yanchun¹,Wang Hu¹,Zhang Kaifeng¹,Yuan Lu¹,Cao Shengzhu¹,Ma Dongfeng¹,Li Lin¹,Yang Miao¹,Gao Hengjiao¹,Wang Kai²^ORCID,Xu Min¹,Li Detian¹

Affiliation:

1. Science and Technology on Vacuum Technology and Physical Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China

2. College of Textiles, Donghua University, Shanghai 201620, China

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

China Academy of Space Technology

Natural Science Foundation of Gansu Province

Defense Industrial Technology Development Program of China

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.3c10434

Reference33 articles.

1. Organosilicon films deposited in low-pressure plasma from hexamethyldisiloxane — A review

2. Roll-to-roll fabrication of large-scale polyorgansiloxane thin film with high flexibility and ultra-efficient atomic oxygen resistance

3. Highly Homogeneous Polysiloxane Flexible Coating for Low Earth Orbital Spacecraft with Ultraefficient Atomic Oxygen Resistance and Self-Healing Behavior

4. Hollow-cathode activated PECVD for the high-rate deposition of permeation barrier films

5. SiO and SiO C H mono- and multi-layer deposits for improved polymer oxygen and water vapor barrier properties

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