Nonclassical Crystallization in Low-Temperature Deposition of Crystalline Silicon by Hot-Wire Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Nonclassical Crystallization in Low-Temperature Deposition of Crystalline Silicon by Hot-Wire Chemical Vapor Deposition

Published:2014-11-10 Issue:12 Volume:14 Page:6239-6247
ISSN:1528-7483
Container-title:Crystal Growth & Design
language:en
Short-container-title:Crystal Growth & Design

Author:

Yoo Seung-Wan¹,Hong Ju-Seop¹,Lee Sung-Soo¹,Kim Chan-Soo²,Kim Tae-Sung³,Hwang Nong-Moon¹

Affiliation:

1. Department of Materials Science & Engineering, Seoul National University, Daehak-dong, Gwanak-gu, Seoul 151-744, Republic of Korea

2. Marine Energy Convergence & Integration Laboratory, JGRC of Korea Institute of Energy Research, Gimnyeong-ri, Gujwa-eup, Jeju-si, Jeju-do 695-971, Republic of Korea

3. Department of Mechanical Engineering, Sungkyunkwan University, 300 Cheoncheon-dong, Jangan-gu, Suwon, Gyunggi-do 440-746, Republic of Korea

Funder

National Research Foundation of Korea

Publisher

American Chemical Society (ACS)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cg5008582

Reference88 articles.

1. Thin-film transistors deposited by hot-wire chemical vapor deposition

2. Present status of micro- and polycrystalline silicon solar cells made by hot-wire chemical vapor deposition

3. Microcrystalline silicon for solar cells deposited at high rates by hot-wire CVD

4. aDerjaguin, B. V.; Fedoseev, D. V.Growth of Diamond and Graphite From the Gas;Nauka:Moscow, 1977; pp1–115.

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