Affiliation:
1. Unité PCPM, Université catholique de Louvain, 1 Croix du Sud, B-1348, Louvain-la-Neuve, Belgium
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Reference63 articles.
1. Brown, W. L.InRadiation Effects In Insulators 3;Wilson, I. H., Webb, R. P., Eds.Gordon and Breach:New York, 1986; Vol. 1, p281.
2. Fabrication of 5–7 nm wide etched lines in silicon using 100 keV electron‐beam lithography and polymethylmethacrylate resist
3. Van Leyen, D.; Deimel, M.; Hagenhoff, B.; Benninghoven, A.InSecondary Ion Mass Spectrometry (SIMS) VII;Benninghoven, A.; Evans, C. A.; McKeegan, K. D.; Storms, H. A.; Werner, H. W., Eds.Wiley:Chichester, U.K., 1990; p157.
4. Preliminary evaluation of an SF5+ polyatomic primary ion beam for analysis of organic thin films by secondary ion mass spectrometry
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