Chemical, Electronic, and Electrical Properties of Alkylated Ge(111) Surfaces
Author:
Affiliation:
1. Beckman Institute and Kavli Nanosciences Institute, Division of Chemistry and Chemical Engineering, 210 Noyes Laboratory, 127-72, California Institute of Technology, Pasadena, California 91125
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/jp101375x
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1. Hafnium oxide gate dielectrics on sulfur-passivated germanium
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