Photophysical Behavior of Triethylmethylammonium Tetrabromoferrate(III) under High Pressure

Author:

Nakagawa Takeshi1ORCID,Ding Yang1,Bu Kejun1ORCID,Lü Xujie1ORCID,Liu Haozhe1,Moliterni Anna2ORCID,Popović Jasminka3ORCID,Mihalik Marian4ORCID,Jagličić Zvonko56,Mihalik Matúš4ORCID,Vrankić Martina3ORCID

Affiliation:

1. Center for High-Pressure Science & Technology Advanced Research, 100094 Beijing, P. R. China

2. Institute of Crystallography (IC)-CNR, Via Amendola 122/O, 70126 Bari, Italy

3. Division of Materials Physics, Rud̵er Bošković Institute, Bijenička 54, 10000 Zagreb, Croatia

4. Institute of Experimental Physics, Watsonova 47, 040 01 Košice, Slovak Republic

5. Institute of Mathematics, Physics and Mechanics, Jadranska 19, 1000 Ljubljana, Slovenia

6. Faculty of Civil and Geodetic Engineering, University of Ljubljana, Jamova 2, 1000 Ljubljana, Slovenia

Funder

Javna Agencija za Raziskovalno Dejavnost RS

National Key Research and Development Program of China

National Natural Science Foundation of China

Hrvatska Akademija znanosti i umjetnosti

Publisher

American Chemical Society (ACS)

Subject

Inorganic Chemistry,Physical and Theoretical Chemistry

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