Contact Area Lithography (CAL): A New Approach to Direct Formation of Nanometric Chemical Patterns
Author:
Affiliation:
1. School of Advanced Materials Engineering, Kookmin University, Seoul 136-702, Korea
2. School of Advanced Materials Engineering, Yonsei University, Seoul 120-749, Korea
3. Department of Chemistry, Kookmin University, Seoul 136-702, Korea
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm052084m
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