Large O2 Cluster Ions as Sputter Beam for ToF-SIMS Depth Profiling of Alkali Metals in Thin SiO2 Films-Reference-Cited by-同舟云学术

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Large O2 Cluster Ions as Sputter Beam for ToF-SIMS Depth Profiling of Alkali Metals in Thin SiO2 Films

Published:2017-02-09 Issue:4 Volume:89 Page:2377-2382
ISSN:0003-2700
Container-title:Analytical Chemistry
language:en
Short-container-title:Anal. Chem.

Author:

Holzer Sabine¹²,Krivec Stefan¹^ORCID,Kayser Sven³,Zakel Julia³,Hutter Herbert²

Affiliation:

1. Infineon Technologies Austria AG, Siemensstraße 2, 9500 Villach, Austria

2. Vienna University of Technology, Institute of Chemical Technologies and Analytics, Getreidemarkt 9, 1060 Vienna, Austria

3. ION-TOF GmbH, Heisenbergstraße 15, 48149 Münster, Germany

Funder

?sterreichische Forschungsf?rderungsgesellschaft

Publisher

American Chemical Society (ACS)

Subject

Analytical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.analchem.6b04222

Reference22 articles.

1. Bond Breaking and the Ionization of Sputtered Atoms

2. Time‐of‐flight secondary ion mass spectrometry of insulators with pulsed charge compensation by low‐energy electrons

3. Beam techniques for the analysis of poorly conducting materials

4. Ion Neutralization Processes at Insulator Surfaces and Consequent Impurity Migration Effects in SiO2Films

5. Mobilization of sodium in SiO2films by ion bombardment

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4. ToF-SIMS Depth Profiling of Metal, Metal Oxide, and Alloy Multilayers in Atmospheres of H2, C2H2, CO, and O2;Journal of the American Society for Mass Spectrometry;2021-12-22

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