Method for Molecular Layer Deposition Using Gas Cluster Ion Beam Sputtering with Example Application In Situ Matrix-Enhanced Secondary Ion Mass Spectrometry-Reference-Cited by-同舟云学术

Method for Molecular Layer Deposition Using Gas Cluster Ion Beam Sputtering with Example Application In Situ Matrix-Enhanced Secondary Ion Mass Spectrometry

Published:2021-02-11 Issue:7 Volume:93 Page:3436-3444
ISSN:0003-2700
Container-title:Analytical Chemistry
language:en
Short-container-title:Anal. Chem.

Author:

Lorenz Matthias¹^ORCID,Zhang Junting¹^ORCID,Shard Alexander G.¹^ORCID,Vorng Jean-Luc¹,Rakowska Paulina D.¹^ORCID,Gilmore Ian S.¹^ORCID

Affiliation:

1. National Physical Laboratory, Hampton Road, Teddington TW11 0LW, United Kingdom

Funder

Department for Business, Energy and Industrial Strategy, UK Government

Publisher

American Chemical Society (ACS)

Subject

Analytical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.analchem.0c04680

Reference41 articles.

1. Universal Equation for Argon Cluster Size-Dependence of Secondary Ion Spectra in SIMS of Organic Materials

2. Ultra high spatial resolution SIMS with cluster ions - approaching the physical limits

3. SIMS of organics—Advances in 2D and 3D imaging and future outlook

4. Metabolic Imaging at the Single-Cell Scale: Recent Advances in Mass Spectrometry Imaging

5. An Experimental and Theoretical Study of Laser Postionization of Femtosecond-Laser-Desorbed Drug Molecules

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