3-Phenyl-3,3-ethylenedioxy-1-propyl Sulfonates as Acid Amplifiers To Enhance the Photosensitivity of Positive-Working Photoresists-Reference-Cited by-同舟云学术

3-Phenyl-3,3-ethylenedioxy-1-propyl Sulfonates as Acid Amplifiers To Enhance the Photosensitivity of Positive-Working Photoresists

Published:1999-07-07 Issue:8 Volume:11 Page:2119-2125
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Kudo Kazuaki¹,Arimitsu Koji¹,Ohmori Hironori¹,Ito Hiromitsu¹,Ichimura Kunihiro¹

Affiliation:

1. Research Laboratory of Resources Utilization, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan, and Materials Research Center, Toppan Co. Ltd., 4-2-3 Takanodai-minami, Sugito, Saitama 345-0046, Japan

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm990054b

Reference15 articles.

1. Chemical amplification in the design of dry developing resist materials

2. (b) Ito, H.; Willson, C. G. InPolymersinElectronics; Davidson, T., Ed.; ACS Symposium Series 242; American Chemical Society: Washington, DC, 1984; p 11.

3. A Novel Concept of Acid Proliferation. Autocatalytic Fragmentation of an Acetoacetate Derivative as an Acid Amplifier

4. Autocatalytic Fragmentation of Acetoacetate Derivatives as Acid Amplifiers to Proliferate Acid Molecules

5. Sensitivity enhancement of chemical-amplification-type photoimaging materials by acetoacetic acid derivatives.

Cited by 35 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study of RLS trade-off mitigation utilizing an organotin-containing chemically amplified resist for high sensitivity patterning;International Conference on Extreme Ultraviolet Lithography 2022;2022-12-01

2. Recent Progress in Photo-Acid Generators for Advanced Photopolymer Materials;Journal of Photopolymer Science and Technology;2020-07-01

3. Molecular Design and Function of Photo-acid Generators Utilized for Advanced Industries;Journal of Synthetic Organic Chemistry, Japan;2020-01-01

4. Photopatterning of PEDOT Derivatives with Photoacid Generators and Acid Amplifiers Generating Polystyrenesulfonic Acid;ACS Applied Polymer Materials;2019-04-02

5. Sensitivity enhancement of chemically amplified EUV resists by adding acid-generating promoters;Japanese Journal of Applied Physics;2017-05-12