Polybenzoxazine as a Mold-Release Agent for Nanoimprint Lithography-Reference-Cited by-同舟云学术

Polybenzoxazine as a Mold-Release Agent for Nanoimprint Lithography

Published:2007-04-26 Issue:11 Volume:23 Page:5868-5871
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Wang Chih-Feng¹,Chiou Shih-Feng¹,Ko Fu-Hsiang¹,Chen Jem-Kun¹,Chou Cheng-Tung¹,Huang Chih-Feng¹,Kuo Shiao-Wei¹,Chang Feng-Chih¹

Affiliation:

1. Department of Materials Science and Engineering, I-Shou University, 84008 Kaohsiung, Taiwan, Department of Chemical & Materials Engineering, National Central University, 32001 Taoyuan, Taiwan, and Institutes of Nanotechnology and Applied Chemistry, National Chiao-Tung University, 30050 Hsinchu, Taiwan

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la062921e

Reference20 articles.

1. Low-Surface-Free-Energy Materials Based on Polybenzoxazines

2. Surface Energy Characteristics of Polymer Film Structures: a Further Insight into the Molecular Design Requirements

3. The deposition of anti-adhesive ultra-thin teflon-like films and their interaction with polymers during hot embossing

4. Imprint of sub‐25 nm vias and trenches in polymers

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