Affiliation:
1. IBM Almaden Research Center, 650 Harry Road, San Jose, California 95120
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Cited by
3 articles.
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1. LER Limitations of Resist Thin Films;Journal of Photopolymer Science and Technology;2012
2. Quantitative measurement of resist outgassing during exposure;Advances in Resist Materials and Processing Technology XXVI;2009-03-13
3. Quantification of outgassing of C-, Si-, and S-containing products during exposure of photoresists;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2009