Effect of Coadsorbed Dopants on Diamond Initial Growth Processes: CH3 Adsorption
Author:
Affiliation:
1. Department of Materials Chemistry, Angstrom Laboratory, Uppsala University, Box 538, SE-751 21 Uppsala, Sweden
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp711402e
Reference27 articles.
1. Modeling of microwave discharges of H2 admixed with CH4 for diamond deposition
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4. A kinetic Monte Carlo method for the atomic-scale simulation of chemical vapor deposition: Application to diamond
5. The role of methyl radicals and acetylene in [100] vs. [111] diamond growth
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