Atomic Layer Deposition Nucleation on Isolated Self-Assembled Monolayer Functional Groups: A Combined DFT and Experimental Study-Reference-Cited by-同舟云学术

Atomic Layer Deposition Nucleation on Isolated Self-Assembled Monolayer Functional Groups: A Combined DFT and Experimental Study

Published:2019-06-18 Issue:7 Volume:2 Page:4618-4628
ISSN:2574-0962
Container-title:ACS Applied Energy Materials
language:en
Short-container-title:ACS Appl. Energy Mater.

Author:

Patwardhan Sameer¹^ORCID,Cao Duyen H.²,Schatz George C.¹^ORCID,Martinson Alex B. F.²^ORCID

Affiliation:

1. Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States

2. Materials Science Division, Argonne National Laboratory, 9700 South Cass Avenue, Argonne, Illinois 60439, United States

Funder

Basic Energy Sciences

Publisher

American Chemical Society (ACS)

Subject

Electrical and Electronic Engineering,Materials Chemistry,Electrochemistry,Energy Engineering and Power Technology,Chemical Engineering (miscellaneous)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsaem.8b02202

Reference55 articles.

1. Atomic Layer Deposition: An Overview

2. Applications of atomic layer deposition to nanofabrication and emerging nanodevices

3. The use of atomic layer deposition in advanced nanopatterning

4. Investigation of Self-Assembled Monolayer Resists for Hafnium Dioxide Atomic Layer Deposition

5. Achieving area-selective atomic layer deposition on patterned substrates by selective surface modification

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