Organic-Functionalized Pure-Silica-Zeolite MFI Low-k Films
Author:
Affiliation:
1. Department of Chemical and Environmental Engineering, University of California, Riverside, California 92521
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm048171g
Reference17 articles.
1. The International Technology Roadmap for Semiconductors, 2002.
2. Low Dielectric Constant Materials for ULSI Interconnects
3. Expanding thermal plasma for low-k dielectrics: engineering the film chemistry by means of specific dissociation paths in the plasma
4. Molecular Templating of Nanoporous Ultralow Dielectric Constant (≈1.5) Organosilicates by Tailoring the Microphase Separation of Triblock Copolymers
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